1-(3-hydroxyquinolin-7-yl)ethanone
$450.00
CAS No.: 1958100-86-1
Catalog No.: 192051
Purity: 95%
MF: C11H9NO2
MW: 187.198
Storage: 2-8 degree Celsius
SMILES: OC=1C=NC2=CC(=CC=C2C1)C(C)=O
Catalog No.: 192051
Purity: 95%
MF: C11H9NO2
MW: 187.198
Storage: 2-8 degree Celsius
SMILES: OC=1C=NC2=CC(=CC=C2C1)C(C)=O
1-(3-hydroxyquinolin-7-yl)ethanone; CAS No.: 1958100-86-1; 1-(3-hydroxyquinolin-7-yl)ethanone. PROPERTIES: 1-(3-hydroxyquinolin-7-yl)ethanone is a white crystalline powder with molecular formula C12H10N2O2. It has a molar mass of 218.22 g/mol and shows limited water solubility but good solubility in ethanol and acetone. The compound melts between 135-138 C. Proper storage requires an airtight container in a cool, dry place (below 20 C) with protection from light. Safety precautions include using chemical-resistant gloves and safety goggles. The compound may cause eye irritation, so immediate rinsing with water is required upon contact. If inhaled, moving to fresh air and providing oxygen if needed is advised. The material should be stored away from heat and incompatible substances like strong acids. APPLICATIONS: In medicinal chemistry, 1-(3-hydroxyquinolin-7-yl)ethanone serves as a key intermediate for developing antimicrobial agents. Research teams at antibiotic development centers have used this compound to synthesize inhibitors of bacterial DNA gyrase. The hydroxyl group provides a hydrogen bond donor that enhances interactions with the enzyme's active site. In oncology, the compound has been explored as a lead for developing topoisomerase inhibitors. A study published in a cancer research journal demonstrated how derivatives of 1-(3-hydroxyquinolin-7-yl)ethanone exhibited cytotoxicity against leukemia cell lines by stabilizing topoisomerase-DNA cleavage complexes. Additionally, in materials science, the compound's photostable properties make it suitable for use in photographic chemicals. Researchers at an imaging technology company incorporated 1-(3-hydroxyquinolin-7-yl)ethanone derivatives into light-sensitive resins for high-resolution photolithography applications.
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